Adjusted odds ratios and 95% confidence intervals for short and long menstrual cycles in female workers according to work areas and potentially exposed chemical agents
| Risk factors | Compared with non-fab | Compared with etching | ||
|---|---|---|---|---|
| Adjusted OR* (95% CI) for short menstrual cycles | Adjusted OR* (95% CI) for long menstrual cycles | Adjusted OR* (95% CI) for short menstrual cycles | Adjusted OR* (95% CI) for long menstrual cycles | |
| As, arsenic compounds; EGEs, ethylene glycol ethers; fab, fabrication; HF, hydrofluoric acid; IPA, isopropyl alcohol; non-fab, non-fabrication; P, phosphorous compounds. | ||||
| *Adjusted for age, education, current smoking habits, work pattern, extra work, stress level classified by psychiatric score, body mass index, and pregnancy history. | ||||
| Non-fab | 1 | 1 | ||
| Fab | 1.5 (0.5 to 4.7) | 2.0 (1.0 to 3.9) | ||
| Etching | 1.4 (0.4 to 4.7) | 0.9 (0.4 to 2.2) | 1 | 1 |
| Thin film | 1.4 (0.3 to 5.8) | 2.0 (0.8 to 4.9) | 0.9 (0.3 to 2.5) | 2.2 (1.1 to 4.8) |
| As+HF+P | 1.6 (0.3 to 7.2) | 2.0 (0.8 to 5.5) | 0.9 (0.3 to 2.5) | 2.1 (1.0 to 4.5) |
| Photolithography | 1.6 (0.3 to 9.4) | 4.4 (1.7 to 11.4) | 1.3 (0.4 to 4.0) | 4.5 (2.0 to 10.0) |
| EGEs+IPA | 0.3 (0.0 to 3.7) | 5.0 (1.7 to 14.1) | 0.9 (0.3 to 3.2) | 4.4 (2.0 to 10.0) |
| Diffusion | 1.3 (0.2 to 8.6) | 3.8 (1.3 to 11.6) | 1.2 (0.4 to 4.0) | 4.1 (1.8 to 9.4) |
| HF+IPA+P | 1.5 (0.2 to 10.2) | 3.5 (1.1 to 10.9) | 1.2 (0.4 to 4.0) | 3.9 (1.7 to 9.1) |