Article Text

PDF

Poster-discussion: Specific occupations and exposures 2
Work-related fatigue among workers on semiconductor manufacturing lines
  1. Yu-Cheng Lin1,
  2. Pau-Chung Chen2
  1. 1En Chu Kong Hospital, New Taipei, Taiwan
  2. 2NTU, Taipei, Taiwan

Abstract

Objectives To examine potential risk factors for work-related fatigue among the apparently healthy workers on semiconductors production lines.

Methods The data, including general health check-up records, need for recovery after work (NFR) scale questionnaires, personal and occupational history, were analyzed for 1545 on-site workers (1117 males, 428 females; mean age 37.6 years). The high-NFR (h-NFR) workers, whose NFR scores were within the top quartile, were defined as workers suffering from work-related fatigue.

Results Comparing to the regular daytime workers, the workers with current but not persistent exposure to shiftwork had a 4.0-fold (95% CI, 2.7 to 5.9) increased risk of h-NFR, higher than the 2.2-fold (95% CI 1.5 to 3.3) elevated risk of h-NFR for persistent shift workers and the 2.1-fold (95% CI 1.4 to 3.2) for workers with prior exposures to shiftwork. The male employees with university attainments had an odd ratio (OR) of 2.8 (95% CI 1.0 to 7.8) for h-NFR, comparing to the male employees having simply mandatory education. For female workers, currently married/cohabiting status inversely associated with h-NFR (OR 0.5; 95% CI 0.2 to 0.9); and child-raising moderately increased risk for h-NFR (OR 1.9; 95% CI 1.0 to 3.7).

Conclusions Among semiconductor manufacturing on-site workers, shiftwork is a major risk factor for work-related fatigue, especially for the employees are adapting to shift schedules. In terms of gender differences, male on-site workers with the higher educational attainment are at the higher risk for work-related fatigue; domestic factors significantly affect female on-site workers in the recovery from work-related fatigue.

Statistics from Altmetric.com

Request permissions

If you wish to reuse any or all of this article please use the link below which will take you to the Copyright Clearance Center’s RightsLink service. You will be able to get a quick price and instant permission to reuse the content in many different ways.